DC/RF Dual-Head High Vacuum 2” Magnetron Plasma Sputtering

VTC-600-2HD is a compact magnetron sputtering system with dual 2" target sources, e.g., one DC source for coating metallic film, and the other RF source for coating non-metallic material. This coating system is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric,?

Lab Coating Equipment - Automatic Film Coater With Vacuum

OEM Manufacturer of Lab Coating Equipment - Automatic Film Coater With Vacuum Chuck And Doctor Blade, Ultra-High Vacuum Thermal Evaporation Coater, DC/RF Dual-Head High Vacuum Plasma Sputtering Coater and DC Plasma Magnetron Sputtering Coater for Metallic Thin Film offered by Nano Science?

Magnetron Sputtering Overview - Angstrom Engineering

The surface of the target is eroded by high-energy ions within the plasma, and the liberated atoms travel through the vacuum environment and deposit onto a substrate to form a thin film. In a typical sputtering deposition process, a chamber is first evacuated to high vacuum to minimize the partial pressures of all background?

2" RF Plasma Magnetron Sputtering Coater for Non-Conductive Thin

VTC-2RF is a compact 2" single head RF Plasma magnetron sputtering system coating non-metallic, mainly oxide thin film. Sealing Flange: 165 mm Dia. made of Aluminum with high-temperature silicone O-ring; Stainless steel mesh cover is included for 100% shielding RF radiation from chamber; Vacuum level: 1.0E-2?

What Is Sputtering? Magnetron Sputtering? - Semicore

Nov 24, 2014 These particles cross the vacuum deposition chamber of the sputter coater and are deposited as a thin film of material on the surface of the substrate to be energy of the bombarding particles is extremely high, much higher than normal thermal energies in the “Fourth state of nature” plasma environment.

Desktop Magnetron Plasma Sputtering Coater with Vacuum Pump

VTC-16-SM is a High Power Desktop Magnetron Plasma Sputtering Coater with a water cooling 2" target head, water chiller and rotatable sample holder. The coating unit is designed for coating all metallic films up to 4" diameter wafer including Zn, Al, Ti and carbon light film at an affordable cost. One Al target is included for?

Synthesis of Alumina Thin Films Using Reactive Magnetron

Abstract. Alumina (Al2O3) thin films were deposited on Si (100) by Magnetron Sputtering in Introduction. Aluminum oxide or Alumina (Al2O3) is an outstanding ceramic material which, due to its several the pumping speed, which is controlled by a throttle valve in the path of high vacuum line connecting the chamber to?

Sputtering System: Business & Industrial | eBay

MeiVac / Alcatel 2460 HEDA PVD Deposition Sputtering / Sputter Coater System! Complete The HEDA RF Diode sputtering system family was developed as a high throughput batch deposition system for thick alumina layers. It has . Versatile high vacuum R&D and pilot production thin film magnetron sputtering system.

3 Heads Compact 1" RF Plasma Magnetron Sputtering Coater, with

VTC-3RF is a three head 1" RF Plasma magnetron sputtering system designed for non-metallic thin film coating, mainly for multilayer oxide thin films. mm Dia. made of Aluminum with high-temperature silicone O-ring; Stainless steel shield cage is included for 100% shielding of RF radiation from the chamber; Max vacuum?

Sputter deposition - Wikipedia

Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment.

DC/RF Dual-Head High Vacuum 2” Magnetron Plasma Sputtering

VTC-600-2HD is a compact magnetron sputtering system with dual 2" target sources, e.g., one DC source for coating metallic film, and the other RF source for coating non-metallic material. This coating system is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric,?

Lab Coating Equipment - Automatic Film Coater With Vacuum

OEM Manufacturer of Lab Coating Equipment - Automatic Film Coater With Vacuum Chuck And Doctor Blade, Ultra-High Vacuum Thermal Evaporation Coater, DC/RF Dual-Head High Vacuum Plasma Sputtering Coater and DC Plasma Magnetron Sputtering Coater for Metallic Thin Film offered by Nano Science?

Magnetron Sputtering Overview - Angstrom Engineering

The surface of the target is eroded by high-energy ions within the plasma, and the liberated atoms travel through the vacuum environment and deposit onto a substrate to form a thin film. In a typical sputtering deposition process, a chamber is first evacuated to high vacuum to minimize the partial pressures of all background?

2" RF Plasma Magnetron Sputtering Coater for Non-Conductive Thin

VTC-2RF is a compact 2" single head RF Plasma magnetron sputtering system coating non-metallic, mainly oxide thin film. Sealing Flange: 165 mm Dia. made of Aluminum with high-temperature silicone O-ring; Stainless steel mesh cover is included for 100% shielding RF radiation from chamber; Vacuum level: 1.0E-2?

What Is Sputtering? Magnetron Sputtering? - Semicore

Nov 24, 2014 These particles cross the vacuum deposition chamber of the sputter coater and are deposited as a thin film of material on the surface of the substrate to be energy of the bombarding particles is extremely high, much higher than normal thermal energies in the “Fourth state of nature” plasma environment.

Desktop Magnetron Plasma Sputtering Coater with Vacuum Pump

VTC-16-SM is a High Power Desktop Magnetron Plasma Sputtering Coater with a water cooling 2" target head, water chiller and rotatable sample holder. The coating unit is designed for coating all metallic films up to 4" diameter wafer including Zn, Al, Ti and carbon light film at an affordable cost. One Al target is included for?

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